Instruct: Identify the main and secondary category of Arxiv papers based on the titles and abstracts
Query: Precision Cutting and Patterning of Graphene with Helium Ions   We report nanoscale patterning of graphene using a helium ion microscope
configured for lithography. Helium ion lithography is a direct-write
lithography process, comparable to conventional focused ion beam patterning,
with no resist or other material contacting the sample surface. In the present
application, graphene samples on Si/SiO2 substrates are cut using helium ions,
with computer controlled alignment, patterning, and exposure. Once suitable
beam doses are determined, sharp edge profiles and clean etching are obtained,
with little evident damage or doping to the sample. This technique provides
fast lithography compatible with graphene, with ~15 nm feature sizes.

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The categories of this paper are: hep-ph
34
The categories of this paper are: chem-ph
25
The categories of this paper are: patt-sol
22
The categories of this paper are: chao-dyn
27
The categories of this paper are: comp-gas
9
The categories of this paper are: nlin
12
The categories of this paper are: nucl-th
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The categories of this paper are: eess
33
The categories of this paper are: plasm-ph
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The categories of this paper are: stat
24
The categories of this paper are: dg-ga
5
The categories of this paper are: gr-qc
30
The categories of this paper are: q-alg
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The categories of this paper are: astro-ph
11
The categories of this paper are: hep-lat
2
The categories of this paper are: math