Instruct: Identify the main and secondary category of Arxiv papers based on the titles and abstracts
Query: Transition metal nitride thin films deposited at CMOS compatible
  temperatures for tunable optoelectronic and plasmonic devices   Transition metal nitrides have received significant interest for use within
plasmonic and optoelectronic devices. However, deposition temperature remains a
significant barrier to the integration of transition metal nitrides as
plasmonic materials within CMOS fabrication processes. Binary, ternary and
layered transition metal nitride thin films based on titanium and niobium
nitride are deposited using High Power Impulse Magnetron Sputtering (HIPIMS).
The increased plasma densities achieved in the HIPIMS process allow high
quality plasmonic thin films to be deposited at CMOS compatible temperatures of
less than 300{\deg}C. Thin films are deposited on a range of industrially
relevant substrates and display tunable plasma frequencies in the ultraviolet
to visible spectral ranges. The thin film quality, combined with the
scalability of the deposition process, indicates that HIPIMS deposition of
nitride films is an industrially viable technique and can pave the way towards
the fabrication of next generation plasmonic and optoelectronic devices.

17
The categories of this paper are: q-fin
24
The categories of this paper are: dg-ga
30
The categories of this paper are: q-alg
34
The categories of this paper are: chem-ph
10
The categories of this paper are: q-bio
15
The categories of this paper are: nucl-ex
25
The categories of this paper are: patt-sol
9
The categories of this paper are: nlin
29
The categories of this paper are: funct-an
21
The categories of this paper are: adap-org
23
The categories of this paper are: solv-int
27
The categories of this paper are: comp-gas
5
The categories of this paper are: gr-qc
33
The categories of this paper are: plasm-ph
14
The categories of this paper are: math-ph
0
The categories of this paper are: hep-ph